$Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction$
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Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction

Coherent x-ray diffractive imaging is a powerful technique for determining strain on the nanometer scale. Here, it is used to image semiconducting GaAs1-yNy structures on a GaAs substrate and to measure strain, demonstrating its potential for studying highly strained interfaces in devices.

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Autores principales:	Felisa Berenguer, Giorgio Pettinari, Marco Felici, Nilanthy Balakrishnan, Jesse N. Clark, Sylvain Ravy, Amalia Patané, Antonio Polimeni, Gianluca Ciatto
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2020
Materias:	Materials of engineering and construction. Mechanics of materials TA401-492
Acceso en línea:	https://doaj.org/article/c552cf1d1c2e495d85ef0e75514ebf38
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id	oai:doaj.org-article:c552cf1d1c2e495d85ef0e75514ebf38
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spelling	oai:doaj.org-article:c552cf1d1c2e495d85ef0e75514ebf382021-12-02T17:33:41ZImaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction10.1038/s43246-020-0021-62662-4443https://doaj.org/article/c552cf1d1c2e495d85ef0e75514ebf382020-04-01T00:00:00Zhttps://doi.org/10.1038/s43246-020-0021-6https://doaj.org/toc/2662-4443Coherent x-ray diffractive imaging is a powerful technique for determining strain on the nanometer scale. Here, it is used to image semiconducting GaAs1-yNy structures on a GaAs substrate and to measure strain, demonstrating its potential for studying highly strained interfaces in devices.Felisa BerenguerGiorgio PettinariMarco FeliciNilanthy BalakrishnanJesse N. ClarkSylvain RavyAmalia PatanéAntonio PolimeniGianluca CiattoNature PortfolioarticleMaterials of engineering and construction. Mechanics of materialsTA401-492ENCommunications Materials, Vol 1, Iss 1, Pp 1-8 (2020)
institution	DOAJ
collection	DOAJ
language	EN
topic	Materials of engineering and construction. Mechanics of materials TA401-492
spellingShingle	Materials of engineering and construction. Mechanics of materials TA401-492 Felisa Berenguer Giorgio Pettinari Marco Felici Nilanthy Balakrishnan Jesse N. Clark Sylvain Ravy Amalia Patané Antonio Polimeni Gianluca Ciatto Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction
description	Coherent x-ray diffractive imaging is a powerful technique for determining strain on the nanometer scale. Here, it is used to image semiconducting GaAs1-yNy structures on a GaAs substrate and to measure strain, demonstrating its potential for studying highly strained interfaces in devices.
format	article
author	Felisa Berenguer Giorgio Pettinari Marco Felici Nilanthy Balakrishnan Jesse N. Clark Sylvain Ravy Amalia Patané Antonio Polimeni Gianluca Ciatto
author_facet	Felisa Berenguer Giorgio Pettinari Marco Felici Nilanthy Balakrishnan Jesse N. Clark Sylvain Ravy Amalia Patané Antonio Polimeni Gianluca Ciatto
author_sort	Felisa Berenguer
title	Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction
title_short	Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction
title_full	Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction
title_fullStr	Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction
title_full_unstemmed	Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction
title_sort	imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction
publisher	Nature Portfolio
publishDate	2020
url	https://doaj.org/article/c552cf1d1c2e495d85ef0e75514ebf38
work_keys_str_mv	AT felisaberenguer imagingshapeandstraininnanoscaleengineeredsemiconductorsforphotonicsbycoherentxraydiffraction AT giorgiopettinari imagingshapeandstraininnanoscaleengineeredsemiconductorsforphotonicsbycoherentxraydiffraction AT marcofelici imagingshapeandstraininnanoscaleengineeredsemiconductorsforphotonicsbycoherentxraydiffraction AT nilanthybalakrishnan imagingshapeandstraininnanoscaleengineeredsemiconductorsforphotonicsbycoherentxraydiffraction AT jessenclark imagingshapeandstraininnanoscaleengineeredsemiconductorsforphotonicsbycoherentxraydiffraction AT sylvainravy imagingshapeandstraininnanoscaleengineeredsemiconductorsforphotonicsbycoherentxraydiffraction AT amaliapatane imagingshapeandstraininnanoscaleengineeredsemiconductorsforphotonicsbycoherentxraydiffraction AT antoniopolimeni imagingshapeandstraininnanoscaleengineeredsemiconductorsforphotonicsbycoherentxraydiffraction AT gianlucaciatto imagingshapeandstraininnanoscaleengineeredsemiconductorsforphotonicsbycoherentxraydiffraction
_version_	1718379964181512192

Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction

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