Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction
Coherent x-ray diffractive imaging is a powerful technique for determining strain on the nanometer scale. Here, it is used to image semiconducting GaAs1-yNy structures on a GaAs substrate and to measure strain, demonstrating its potential for studying highly strained interfaces in devices.
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| Autores principales: | , , , , , , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
Nature Portfolio
2020
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/c552cf1d1c2e495d85ef0e75514ebf38 |
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