Mechanism of carrier controllability with metal capping layer on amorphous oxide SiZnSnO semiconductor

Abstract The change of electrical performance of amorphous SiZnSnO thin film transistors (a-SZTO TFTs) has been investigated depending on various metal capping layers on the channel layer by causing different contact property. It was confirmed that the change of electrical characteristics was sensit...

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Autores principales: Byeong Hyeon Lee, Ahrum Sohn, Sangsig Kim, Sang Yeol Lee
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2019
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Acceso en línea:https://doaj.org/article/c56da8c0b642482ebdd3bba047011670
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