Nanocrystallized Ge-Rich SiGe-HfO<sub>2</sub> Highly Photosensitive in Short-Wave Infrared

Nanocrystallized Ge-Rich SiGe-HfO<sub>2</sub> Highly Photosensitive in Short-Wave Infrared

Group IV nanocrystals (NCs), in particular from the Si–Ge system, are of high interest for Si photonics applications. Ge-rich SiGe NCs embedded in nanocrystallized HfO<sub>2</sub> were obtained by magnetron sputtering deposition followed by rapid thermal annealing at 600 °C for nanostruc...

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Détails bibliographiques
Auteurs principaux: Catalin Palade, Ana-Maria Lepadatu, Adrian Slav, Valentin Serban Teodorescu, Toma Stoica, Magdalena Lidia Ciurea, Doru Ursutiu, Cornel Samoila
Format: article
Langue:EN
Publié: MDPI AG 2021
Sujets:
group IV nanocrystals
HfO<sub>2</sub>
magnetron sputtering
rapid thermal annealing
SWIR
spectral photocurrent
Technology
T
Electrical engineering. Electronics. Nuclear engineering
TK1-9971
Engineering (General). Civil engineering (General)
TA1-2040
Microscopy
QH201-278.5
Descriptive and experimental mechanics
QC120-168.85
Accès en ligne:https://doaj.org/article/c6011a9370384f2894af748a47ad2511
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https://doaj.org/article/c6011a9370384f2894af748a47ad2511

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