Nanocrystallized Ge-Rich SiGe-HfO<sub>2</sub> Highly Photosensitive in Short-Wave Infrared

Group IV nanocrystals (NCs), in particular from the Si–Ge system, are of high interest for Si photonics applications. Ge-rich SiGe NCs embedded in nanocrystallized HfO<sub>2</sub> were obtained by magnetron sputtering deposition followed by rapid thermal annealing at 600 °C for nanostruc...

Descripción completa

Guardado en:

Detalles Bibliográficos
Autores principales:	Catalin Palade, Ana-Maria Lepadatu, Adrian Slav, Valentin Serban Teodorescu, Toma Stoica, Magdalena Lidia Ciurea, Doru Ursutiu, Cornel Samoila
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	group IV nanocrystals HfO<sub>2</sub> magnetron sputtering rapid thermal annealing SWIR spectral photocurrent Technology T Electrical engineering. Electronics. Nuclear engineering TK1-9971 Engineering (General). Civil engineering (General) TA1-2040 Microscopy QH201-278.5 Descriptive and experimental mechanics QC120-168.85
Acceso en línea:	https://doaj.org/article/c6011a9370384f2894af748a47ad2511
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

Sea el primero en dejar un comentario!

Nanocrystallized Ge-Rich SiGe-HfO<sub>2</sub> Highly Photosensitive in Short-Wave Infrared

Ejemplares similares