Massively parallel fabrication of crack-defined gold break junctions featuring sub-3 nm gaps for molecular devices

The field of molecular electronics is currently held back by the lack of scalability and reproducibility of existing break junction technologies. Here, Dubois et al. demonstrate parallel fabrication of millions of gold break junctions with sub-3 nm gaps via controllable crack formation on a wafer sc...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Valentin Dubois, Shyamprasad N. Raja, Pascal Gehring, Sabina Caneva, Herre S. J. van der Zant, Frank Niklaus, Göran Stemme
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2018
Materias:
Q
Acceso en línea:https://doaj.org/article/c6455ba1125045c28f4b2ec94ec92297
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
Descripción
Sumario:The field of molecular electronics is currently held back by the lack of scalability and reproducibility of existing break junction technologies. Here, Dubois et al. demonstrate parallel fabrication of millions of gold break junctions with sub-3 nm gaps via controllable crack formation on a wafer scale.