Massively parallel fabrication of crack-defined gold break junctions featuring sub-3 nm gaps for molecular devices

The field of molecular electronics is currently held back by the lack of scalability and reproducibility of existing break junction technologies. Here, Dubois et al. demonstrate parallel fabrication of millions of gold break junctions with sub-3 nm gaps via controllable crack formation on a wafer sc...

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Autores principales: Valentin Dubois, Shyamprasad N. Raja, Pascal Gehring, Sabina Caneva, Herre S. J. van der Zant, Frank Niklaus, Göran Stemme
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Lenguaje:EN
Publicado: Nature Portfolio 2018
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Acceso en línea:https://doaj.org/article/c6455ba1125045c28f4b2ec94ec92297
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spelling oai:doaj.org-article:c6455ba1125045c28f4b2ec94ec922972021-12-02T14:39:07ZMassively parallel fabrication of crack-defined gold break junctions featuring sub-3 nm gaps for molecular devices10.1038/s41467-018-05785-22041-1723https://doaj.org/article/c6455ba1125045c28f4b2ec94ec922972018-08-01T00:00:00Zhttps://doi.org/10.1038/s41467-018-05785-2https://doaj.org/toc/2041-1723The field of molecular electronics is currently held back by the lack of scalability and reproducibility of existing break junction technologies. Here, Dubois et al. demonstrate parallel fabrication of millions of gold break junctions with sub-3 nm gaps via controllable crack formation on a wafer scale.Valentin DuboisShyamprasad N. RajaPascal GehringSabina CanevaHerre S. J. van der ZantFrank NiklausGöran StemmeNature PortfolioarticleScienceQENNature Communications, Vol 9, Iss 1, Pp 1-10 (2018)
institution DOAJ
collection DOAJ
language EN
topic Science
Q
spellingShingle Science
Q
Valentin Dubois
Shyamprasad N. Raja
Pascal Gehring
Sabina Caneva
Herre S. J. van der Zant
Frank Niklaus
Göran Stemme
Massively parallel fabrication of crack-defined gold break junctions featuring sub-3 nm gaps for molecular devices
description The field of molecular electronics is currently held back by the lack of scalability and reproducibility of existing break junction technologies. Here, Dubois et al. demonstrate parallel fabrication of millions of gold break junctions with sub-3 nm gaps via controllable crack formation on a wafer scale.
format article
author Valentin Dubois
Shyamprasad N. Raja
Pascal Gehring
Sabina Caneva
Herre S. J. van der Zant
Frank Niklaus
Göran Stemme
author_facet Valentin Dubois
Shyamprasad N. Raja
Pascal Gehring
Sabina Caneva
Herre S. J. van der Zant
Frank Niklaus
Göran Stemme
author_sort Valentin Dubois
title Massively parallel fabrication of crack-defined gold break junctions featuring sub-3 nm gaps for molecular devices
title_short Massively parallel fabrication of crack-defined gold break junctions featuring sub-3 nm gaps for molecular devices
title_full Massively parallel fabrication of crack-defined gold break junctions featuring sub-3 nm gaps for molecular devices
title_fullStr Massively parallel fabrication of crack-defined gold break junctions featuring sub-3 nm gaps for molecular devices
title_full_unstemmed Massively parallel fabrication of crack-defined gold break junctions featuring sub-3 nm gaps for molecular devices
title_sort massively parallel fabrication of crack-defined gold break junctions featuring sub-3 nm gaps for molecular devices
publisher Nature Portfolio
publishDate 2018
url https://doaj.org/article/c6455ba1125045c28f4b2ec94ec92297
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