Fabrication of parabolic Si nanostructures by nanosphere lithography and its application for solar cells
Abstract We demonstrated fabrication of a parabola shaped Si nanostructures of various periods by combined approach of nanosphere lithography and a single step CF4/O2 reactive ion etch (RIE) process. Silica nanosphere monolayers in a hexagonal array were well deposited by a solvent controlled spin c...
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Auteurs principaux: | , , , , , , , , , , |
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Format: | article |
Langue: | EN |
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Nature Portfolio
2017
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Accès en ligne: | https://doaj.org/article/d3d206703b924c93afa4cc6796aedb4d |
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