Fabrication of parabolic Si nanostructures by nanosphere lithography and its application for solar cells

Abstract We demonstrated fabrication of a parabola shaped Si nanostructures of various periods by combined approach of nanosphere lithography and a single step CF4/O2 reactive ion etch (RIE) process. Silica nanosphere monolayers in a hexagonal array were well deposited by a solvent controlled spin c...

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Autores principales:	See-Eun Cheon, Hyeon-seung Lee, Jihye Choi, Ah Reum Jeong, Taek Sung Lee, Doo Seok Jeong, Kyeong-Seok Lee, Wook-Seong Lee, Won Mok Kim, Heon Lee, Inho Kim
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2017
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/d3d206703b924c93afa4cc6796aedb4d
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spelling	oai:doaj.org-article:d3d206703b924c93afa4cc6796aedb4d2021-12-02T15:05:01ZFabrication of parabolic Si nanostructures by nanosphere lithography and its application for solar cells10.1038/s41598-017-07463-72045-2322https://doaj.org/article/d3d206703b924c93afa4cc6796aedb4d2017-08-01T00:00:00Zhttps://doi.org/10.1038/s41598-017-07463-7https://doaj.org/toc/2045-2322Abstract We demonstrated fabrication of a parabola shaped Si nanostructures of various periods by combined approach of nanosphere lithography and a single step CF4/O2 reactive ion etch (RIE) process. Silica nanosphere monolayers in a hexagonal array were well deposited by a solvent controlled spin coating technique based on binary organic solvents. We showed numerically that a parabolic Si nanostructure of an optimal period among various-shaped nanostructures overcoated with a dielectric layer of a 70 nm thickness provide the most effective antireflection. As the simulation results as a design guide, we fabricated the parabolic Si nanostructures of a 520 nm period and a 300 nm height exhibiting the lowest weighted reflectance of 2.75%. With incorporation of such parabolic Si nanostructures, a damage removal process for 20 sec and SiNx antireflection coating of a 70 nm thickness, the efficiency of solar cells increased to 17.2% while that of the planar cells without the nanostructures exhibited 16.2%. The efficiency enhancement of the cell with the Si nanostructures was attributed to the improved photocurrents arising from the broad spectral antireflection which was confirmed by the external quantum efficiency (EQE) measurements.See-Eun CheonHyeon-seung LeeJihye ChoiAh Reum JeongTaek Sung LeeDoo Seok JeongKyeong-Seok LeeWook-Seong LeeWon Mok KimHeon LeeInho KimNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 7, Iss 1, Pp 1-9 (2017)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q See-Eun Cheon Hyeon-seung Lee Jihye Choi Ah Reum Jeong Taek Sung Lee Doo Seok Jeong Kyeong-Seok Lee Wook-Seong Lee Won Mok Kim Heon Lee Inho Kim Fabrication of parabolic Si nanostructures by nanosphere lithography and its application for solar cells
description	Abstract We demonstrated fabrication of a parabola shaped Si nanostructures of various periods by combined approach of nanosphere lithography and a single step CF4/O2 reactive ion etch (RIE) process. Silica nanosphere monolayers in a hexagonal array were well deposited by a solvent controlled spin coating technique based on binary organic solvents. We showed numerically that a parabolic Si nanostructure of an optimal period among various-shaped nanostructures overcoated with a dielectric layer of a 70 nm thickness provide the most effective antireflection. As the simulation results as a design guide, we fabricated the parabolic Si nanostructures of a 520 nm period and a 300 nm height exhibiting the lowest weighted reflectance of 2.75%. With incorporation of such parabolic Si nanostructures, a damage removal process for 20 sec and SiNx antireflection coating of a 70 nm thickness, the efficiency of solar cells increased to 17.2% while that of the planar cells without the nanostructures exhibited 16.2%. The efficiency enhancement of the cell with the Si nanostructures was attributed to the improved photocurrents arising from the broad spectral antireflection which was confirmed by the external quantum efficiency (EQE) measurements.
format	article
author	See-Eun Cheon Hyeon-seung Lee Jihye Choi Ah Reum Jeong Taek Sung Lee Doo Seok Jeong Kyeong-Seok Lee Wook-Seong Lee Won Mok Kim Heon Lee Inho Kim
author_facet	See-Eun Cheon Hyeon-seung Lee Jihye Choi Ah Reum Jeong Taek Sung Lee Doo Seok Jeong Kyeong-Seok Lee Wook-Seong Lee Won Mok Kim Heon Lee Inho Kim
author_sort	See-Eun Cheon
title	Fabrication of parabolic Si nanostructures by nanosphere lithography and its application for solar cells
title_short	Fabrication of parabolic Si nanostructures by nanosphere lithography and its application for solar cells
title_full	Fabrication of parabolic Si nanostructures by nanosphere lithography and its application for solar cells
title_fullStr	Fabrication of parabolic Si nanostructures by nanosphere lithography and its application for solar cells
title_full_unstemmed	Fabrication of parabolic Si nanostructures by nanosphere lithography and its application for solar cells
title_sort	fabrication of parabolic si nanostructures by nanosphere lithography and its application for solar cells
publisher	Nature Portfolio
publishDate	2017
url	https://doaj.org/article/d3d206703b924c93afa4cc6796aedb4d
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Fabrication of parabolic Si nanostructures by nanosphere lithography and its application for solar cells

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