Electric-field-controlled interface dipole modulation for Si-based memory devices
Abstract Various nonvolatile memory devices have been investigated to replace Si-based flash memories or emulate synaptic plasticity for next-generation neuromorphic computing. A crucial criterion to achieve low-cost high-density memory chips is material compatibility with conventional Si technologi...
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2018
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oai:doaj.org-article:d418fb7703f649cdb06f092aed18129a2021-12-02T15:08:11ZElectric-field-controlled interface dipole modulation for Si-based memory devices10.1038/s41598-018-26692-y2045-2322https://doaj.org/article/d418fb7703f649cdb06f092aed18129a2018-05-01T00:00:00Zhttps://doi.org/10.1038/s41598-018-26692-yhttps://doaj.org/toc/2045-2322Abstract Various nonvolatile memory devices have been investigated to replace Si-based flash memories or emulate synaptic plasticity for next-generation neuromorphic computing. A crucial criterion to achieve low-cost high-density memory chips is material compatibility with conventional Si technologies. In this paper, we propose and demonstrate a new memory concept, interface dipole modulation (IDM) memory. IDM can be integrated as a Si field-effect transistor (FET) based memory device. The first demonstration of this concept employed a HfO2/Si MOS capacitor where the interface monolayer (ML) TiO2 functions as a dipole modulator. However, this configuration is unsuitable for Si-FET-based devices due to its large interface state density (D it ). Consequently, we propose, a multi-stacked amorphous HfO2/1-ML TiO2/SiO2 IDM structure to realize a low D it and a wide memory window. Herein we describe the quasi-static and pulse response characteristics of multi-stacked IDM MOS capacitors and demonstrate flash-type and analog memory operations of an IDM FET device.Noriyuki MiyataNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 8, Iss 1, Pp 1-9 (2018) |
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Medicine R Science Q Noriyuki Miyata Electric-field-controlled interface dipole modulation for Si-based memory devices |
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Abstract Various nonvolatile memory devices have been investigated to replace Si-based flash memories or emulate synaptic plasticity for next-generation neuromorphic computing. A crucial criterion to achieve low-cost high-density memory chips is material compatibility with conventional Si technologies. In this paper, we propose and demonstrate a new memory concept, interface dipole modulation (IDM) memory. IDM can be integrated as a Si field-effect transistor (FET) based memory device. The first demonstration of this concept employed a HfO2/Si MOS capacitor where the interface monolayer (ML) TiO2 functions as a dipole modulator. However, this configuration is unsuitable for Si-FET-based devices due to its large interface state density (D it ). Consequently, we propose, a multi-stacked amorphous HfO2/1-ML TiO2/SiO2 IDM structure to realize a low D it and a wide memory window. Herein we describe the quasi-static and pulse response characteristics of multi-stacked IDM MOS capacitors and demonstrate flash-type and analog memory operations of an IDM FET device. |
format |
article |
author |
Noriyuki Miyata |
author_facet |
Noriyuki Miyata |
author_sort |
Noriyuki Miyata |
title |
Electric-field-controlled interface dipole modulation for Si-based memory devices |
title_short |
Electric-field-controlled interface dipole modulation for Si-based memory devices |
title_full |
Electric-field-controlled interface dipole modulation for Si-based memory devices |
title_fullStr |
Electric-field-controlled interface dipole modulation for Si-based memory devices |
title_full_unstemmed |
Electric-field-controlled interface dipole modulation for Si-based memory devices |
title_sort |
electric-field-controlled interface dipole modulation for si-based memory devices |
publisher |
Nature Portfolio |
publishDate |
2018 |
url |
https://doaj.org/article/d418fb7703f649cdb06f092aed18129a |
work_keys_str_mv |
AT noriyukimiyata electricfieldcontrolledinterfacedipolemodulationforsibasedmemorydevices |
_version_ |
1718388283433549824 |