Author Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors

Author Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors

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Autores principales: Hae Won Cho, Pavan Pujar, Minsu Choi, Seunghun Kang, Seongin Hong, Junwoo Park, Seungho Baek, Yunseok Kim, Jaichan Lee, Sunkook Kim
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2021
Materias:
Materials of engineering and construction. Mechanics of materials
TA401-492
Chemistry
QD1-999
Acceso en línea:https://doaj.org/article/d5cf3313bcad4fcf9509a27e8b2909b3
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spelling oai:doaj.org-article:d5cf3313bcad4fcf9509a27e8b2909b32021-12-02T16:53:15ZAuthor Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors10.1038/s41699-021-00240-12397-7132https://doaj.org/article/d5cf3313bcad4fcf9509a27e8b2909b32021-05-01T00:00:00Zhttps://doi.org/10.1038/s41699-021-00240-1https://doaj.org/toc/2397-7132Hae Won ChoPavan PujarMinsu ChoiSeunghun KangSeongin HongJunwoo ParkSeungho BaekYunseok KimJaichan LeeSunkook KimNature PortfolioarticleMaterials of engineering and construction. Mechanics of materialsTA401-492ChemistryQD1-999ENnpj 2D Materials and Applications, Vol 5, Iss 1, Pp 1-1 (2021)
institution DOAJ
collection DOAJ
language EN
topic Materials of engineering and construction. Mechanics of materials
TA401-492
Chemistry
QD1-999
spellingShingle Materials of engineering and construction. Mechanics of materials
TA401-492
Chemistry
QD1-999
Hae Won Cho
Pavan Pujar
Minsu Choi
Seunghun Kang
Seongin Hong
Junwoo Park
Seungho Baek
Yunseok Kim
Jaichan Lee
Sunkook Kim
Author Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors
format article
author Hae Won Cho
Pavan Pujar
Minsu Choi
Seunghun Kang
Seongin Hong
Junwoo Park
Seungho Baek
Yunseok Kim
Jaichan Lee
Sunkook Kim
author_facet Hae Won Cho
Pavan Pujar
Minsu Choi
Seunghun Kang
Seongin Hong
Junwoo Park
Seungho Baek
Yunseok Kim
Jaichan Lee
Sunkook Kim
author_sort Hae Won Cho
title Author Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors
title_short Author Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors
title_full Author Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors
title_fullStr Author Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors
title_full_unstemmed Author Correction: Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors
title_sort author correction: direct growth of orthorhombic hf0.5zr0.5o2 thin films for hysteresis-free mos2 negative capacitance field-effect transistors
publisher Nature Portfolio
publishDate 2021
url https://doaj.org/article/d5cf3313bcad4fcf9509a27e8b2909b3
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AT pavanpujar authorcorrectiondirectgrowthoforthorhombichf05zr05o2thinfilmsforhysteresisfreemos2negativecapacitancefieldeffecttransistors
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AT seunghunkang authorcorrectiondirectgrowthoforthorhombichf05zr05o2thinfilmsforhysteresisfreemos2negativecapacitancefieldeffecttransistors
AT seonginhong authorcorrectiondirectgrowthoforthorhombichf05zr05o2thinfilmsforhysteresisfreemos2negativecapacitancefieldeffecttransistors
AT junwoopark authorcorrectiondirectgrowthoforthorhombichf05zr05o2thinfilmsforhysteresisfreemos2negativecapacitancefieldeffecttransistors
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AT yunseokkim authorcorrectiondirectgrowthoforthorhombichf05zr05o2thinfilmsforhysteresisfreemos2negativecapacitancefieldeffecttransistors
AT jaichanlee authorcorrectiondirectgrowthoforthorhombichf05zr05o2thinfilmsforhysteresisfreemos2negativecapacitancefieldeffecttransistors
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