Barrier Inhomogeneity of Schottky Diode on Nonpolar AlN Grown by Physical Vapor Transport

An aluminum nitride (AlN) Schottky barrier diode (SBD) was fabricated on a nonpolar AlN crystal grown on tungsten substrate by physical vapor transport. The Ni/Au&#x2013;AlN SBD features a low ideality factor <inline-formula> <tex-math notation="LaTeX">${n}$ </tex-math&g...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Qin Zhou, Honglei Wu, Hui Li, Xi Tang, Zuoyan Qin, Dan Dong, Yan Lin, Chengjin Lu, Ran Qiu, Ruisheng Zheng, Jiannong Wang, Baikui Li
Formato: article
Lenguaje:EN
Publicado: IEEE 2019
Materias:
AlN
Acceso en línea:https://doaj.org/article/e09472d1c1f04b05af3b537c7db7e331
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
Descripción
Sumario:An aluminum nitride (AlN) Schottky barrier diode (SBD) was fabricated on a nonpolar AlN crystal grown on tungsten substrate by physical vapor transport. The Ni/Au&#x2013;AlN SBD features a low ideality factor <inline-formula> <tex-math notation="LaTeX">${n}$ </tex-math></inline-formula> of 3.3 and an effective Schottky barrier height (SBH) of 1.05 eV at room temperature. The ideality factor <inline-formula> <tex-math notation="LaTeX">${n}$ </tex-math></inline-formula> decreases and the effective SBH increases at high temperatures. The temperature dependences of <inline-formula> <tex-math notation="LaTeX">${n}$ </tex-math></inline-formula> and SBH were explained using an inhomogeneous model. A mean SBH of 2.105 eV was obtained for the Ni&#x2013;AlN Schottky junction from the inhomogeneity analysis of the current&#x2013;voltage characteristics. An equation in which the parameters have explicit physical meanings in thermionic emission theory is proposed to describe the current&#x2013;voltage characteristics of inhomogeneous SBDs.