Electrodeposition of aluminum-doped thin silicon films from a KF-KCl-KI-K2SiF6-AlF3 melt
The regularities of silicon and aluminum co-deposition on glassy carbon from KF–KCl (2:1)–75 mol % KI–0.15 mol % K2SiF6–(up to 0.15 mol %) AlF3 melts at 998 K were studied by cyclic voltammetry, chronoamperometry, scanning electron microscopy, atomic force microscopy and Raman spectroscopy. The cycl...
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| Autores principales: | , , , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
Serbian Chemical Society
2021
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/e6d8f3a87c2c41948bc5043d16e8dddf |
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