Operando SXRD study of the structure and growth process of Cu2S ultra-thin films

Operando SXRD study of the structure and growth process of Cu2S ultra-thin films

Abstract Electrochemical Atomic Layer Deposition (E-ALD) technique has demonstrated to be a suitable process for growing compound semiconductors, by alternating the under-potential deposition (UPD) of the metallic element with the UPD of the non-metallic element. The cycle can be repeated several ti...

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Autores principales: Andrea Giaccherini, Serena Cinotti, Annalisa Guerri, Francesco Carlà, Giordano Montegrossi, Francesco Vizza, Alessandro Lavacchi, Roberto Felici, Francesco Di Benedetto, Massimo Innocenti
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2017
Materias:
Medicine
R
Science
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Acceso en línea:https://doaj.org/article/e7e9d78f6f7e46179762022f3323b022
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https://doaj.org/article/e7e9d78f6f7e46179762022f3323b022

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