Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting

Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting

Usually, the residual layer remains after patterning TiO<sub>2</sub> sol. The existence of the TiO<sub>2</sub> residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricat...

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Detalles Bibliográficos
Autores principales: Zhoufang Zeng, Gang Shi, Florian Ion Tiberiu Petrescu, Liviu Marian Ungureanu, Ying Li
Formato: article
Lenguaje:EN
Publicado: MDPI AG 2021
Materias:
TiO<sub>2</sub>
PMMA
residual
imprinting
patterns
arrays
Technology
T
Engineering (General). Civil engineering (General)
TA1-2040
Biology (General)
QH301-705.5
Physics
QC1-999
Chemistry
QD1-999
Acceso en línea:https://doaj.org/article/ecc88027576c4bfab577fceb8b6ef3aa
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https://doaj.org/article/ecc88027576c4bfab577fceb8b6ef3aa

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