Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting
Usually, the residual layer remains after patterning TiO<sub>2</sub> sol. The existence of the TiO<sub>2</sub> residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricat...
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| Autores principales: | , , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
MDPI AG
2021
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/ecc88027576c4bfab577fceb8b6ef3aa |
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| Sumario: | Usually, the residual layer remains after patterning TiO<sub>2</sub> sol. The existence of the TiO<sub>2</sub> residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricate a residual-free TiO<sub>2</sub> pattern is proposed. The thermoplastic polymer with Ti<sup>4+</sup> salt was fast patterned at room temperature by imprinting, based on the different interfacial force. Then, the patterned thermoplastic polymer with Ti<sup>4+</sup> salt was induced into the TiO<sub>2</sub> lines without residual layer under the hydrothermal condition. This method provides a new idea to pattern metal oxide without residual layer, which is potentially applied to the gas sensor, the optical detector and the light emitting diode. |
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