Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting

Usually, the residual layer remains after patterning TiO<sub>2</sub> sol. The existence of the TiO<sub>2</sub> residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricat...

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Autores principales: Zhoufang Zeng, Gang Shi, Florian Ion Tiberiu Petrescu, Liviu Marian Ungureanu, Ying Li
Formato: article
Lenguaje:EN
Publicado: MDPI AG 2021
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Acceso en línea:https://doaj.org/article/ecc88027576c4bfab577fceb8b6ef3aa
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Sumario:Usually, the residual layer remains after patterning TiO<sub>2</sub> sol. The existence of the TiO<sub>2</sub> residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricate a residual-free TiO<sub>2</sub> pattern is proposed. The thermoplastic polymer with Ti<sup>4+</sup> salt was fast patterned at room temperature by imprinting, based on the different interfacial force. Then, the patterned thermoplastic polymer with Ti<sup>4+</sup> salt was induced into the TiO<sub>2</sub> lines without residual layer under the hydrothermal condition. This method provides a new idea to pattern metal oxide without residual layer, which is potentially applied to the gas sensor, the optical detector and the light emitting diode.