Micro-Nano Machining TiO2 Patterns without Residual Layer by Unconventional Imprinting

Usually, the residual layer remains after patterning TiO2 sol. The existence of the TiO2 residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricat...

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Autores principales:	Zhoufang Zeng, Gang Shi, Florian Ion Tiberiu Petrescu, Liviu Marian Ungureanu, Ying Li
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	TiO<sub>2</sub> PMMA residual imprinting patterns arrays Technology T Engineering (General). Civil engineering (General) TA1-2040 Biology (General) QH301-705.5 Physics QC1-999 Chemistry QD1-999
Acceso en línea:	https://doaj.org/article/ecc88027576c4bfab577fceb8b6ef3aa
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id	oai:doaj.org-article:ecc88027576c4bfab577fceb8b6ef3aa
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spelling	oai:doaj.org-article:ecc88027576c4bfab577fceb8b6ef3aa2021-11-11T15:09:42ZMicro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting10.3390/app1121100972076-3417https://doaj.org/article/ecc88027576c4bfab577fceb8b6ef3aa2021-10-01T00:00:00Zhttps://www.mdpi.com/2076-3417/11/21/10097https://doaj.org/toc/2076-3417Usually, the residual layer remains after patterning TiO<sub>2</sub> sol. The existence of the TiO<sub>2</sub> residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricate a residual-free TiO<sub>2</sub> pattern is proposed. The thermoplastic polymer with Ti<sup>4+</sup> salt was fast patterned at room temperature by imprinting, based on the different interfacial force. Then, the patterned thermoplastic polymer with Ti<sup>4+</sup> salt was induced into the TiO<sub>2</sub> lines without residual layer under the hydrothermal condition. This method provides a new idea to pattern metal oxide without residual layer, which is potentially applied to the gas sensor, the optical detector and the light emitting diode.Zhoufang ZengGang ShiFlorian Ion Tiberiu PetrescuLiviu Marian UngureanuYing LiMDPI AGarticleTiO<sub>2</sub>PMMAresidualimprintingpatternsarraysTechnologyTEngineering (General). Civil engineering (General)TA1-2040Biology (General)QH301-705.5PhysicsQC1-999ChemistryQD1-999ENApplied Sciences, Vol 11, Iss 10097, p 10097 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	TiO<sub>2</sub> PMMA residual imprinting patterns arrays Technology T Engineering (General). Civil engineering (General) TA1-2040 Biology (General) QH301-705.5 Physics QC1-999 Chemistry QD1-999
spellingShingle	TiO<sub>2</sub> PMMA residual imprinting patterns arrays Technology T Engineering (General). Civil engineering (General) TA1-2040 Biology (General) QH301-705.5 Physics QC1-999 Chemistry QD1-999 Zhoufang Zeng Gang Shi Florian Ion Tiberiu Petrescu Liviu Marian Ungureanu Ying Li Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting
description	Usually, the residual layer remains after patterning TiO<sub>2</sub> sol. The existence of the TiO<sub>2</sub> residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricate a residual-free TiO<sub>2</sub> pattern is proposed. The thermoplastic polymer with Ti<sup>4+</sup> salt was fast patterned at room temperature by imprinting, based on the different interfacial force. Then, the patterned thermoplastic polymer with Ti<sup>4+</sup> salt was induced into the TiO<sub>2</sub> lines without residual layer under the hydrothermal condition. This method provides a new idea to pattern metal oxide without residual layer, which is potentially applied to the gas sensor, the optical detector and the light emitting diode.
format	article
author	Zhoufang Zeng Gang Shi Florian Ion Tiberiu Petrescu Liviu Marian Ungureanu Ying Li
author_facet	Zhoufang Zeng Gang Shi Florian Ion Tiberiu Petrescu Liviu Marian Ungureanu Ying Li
author_sort	Zhoufang Zeng
title	Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting
title_short	Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting
title_full	Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting
title_fullStr	Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting
title_full_unstemmed	Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting
title_sort	micro-nano machining tio<sub>2</sub> patterns without residual layer by unconventional imprinting
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/ecc88027576c4bfab577fceb8b6ef3aa
work_keys_str_mv	AT zhoufangzeng micronanomachiningtiosub2subpatternswithoutresiduallayerbyunconventionalimprinting AT gangshi micronanomachiningtiosub2subpatternswithoutresiduallayerbyunconventionalimprinting AT florianiontiberiupetrescu micronanomachiningtiosub2subpatternswithoutresiduallayerbyunconventionalimprinting AT liviumarianungureanu micronanomachiningtiosub2subpatternswithoutresiduallayerbyunconventionalimprinting AT yingli micronanomachiningtiosub2subpatternswithoutresiduallayerbyunconventionalimprinting
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Micro-Nano Machining TiO<sub>2</sub> Patterns without Residual Layer by Unconventional Imprinting

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