Evolution of defect formation during atomically precise desulfurization of monolayer MoS2

Desulfurization of MoS2 alters its chemical and physical properties by breaking structural symmetry. Here, the atomic-scale mechanistic pathway by which this occurs is investigated during plasma etching, and changes in chemical structure and physical properties are revealed.

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Autores principales: Jong-Young Lee, Jong Hun Kim, Yeonjoon Jung, June Chul Shin, Yangjin Lee, Kwanpyo Kim, Namwon Kim, Arend M. van der Zande, Jangyup Son, Gwan-Hyoung Lee
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Lenguaje:EN
Publicado: Nature Portfolio 2021
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Acceso en línea:https://doaj.org/article/ed299cd15c9141ce92bfacd76719fb4d
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spelling oai:doaj.org-article:ed299cd15c9141ce92bfacd76719fb4d2021-12-02T16:17:33ZEvolution of defect formation during atomically precise desulfurization of monolayer MoS210.1038/s43246-021-00185-42662-4443https://doaj.org/article/ed299cd15c9141ce92bfacd76719fb4d2021-07-01T00:00:00Zhttps://doi.org/10.1038/s43246-021-00185-4https://doaj.org/toc/2662-4443Desulfurization of MoS2 alters its chemical and physical properties by breaking structural symmetry. Here, the atomic-scale mechanistic pathway by which this occurs is investigated during plasma etching, and changes in chemical structure and physical properties are revealed.Jong-Young LeeJong Hun KimYeonjoon JungJune Chul ShinYangjin LeeKwanpyo KimNamwon KimArend M. van der ZandeJangyup SonGwan-Hyoung LeeNature PortfolioarticleMaterials of engineering and construction. Mechanics of materialsTA401-492ENCommunications Materials, Vol 2, Iss 1, Pp 1-10 (2021)
institution DOAJ
collection DOAJ
language EN
topic Materials of engineering and construction. Mechanics of materials
TA401-492
spellingShingle Materials of engineering and construction. Mechanics of materials
TA401-492
Jong-Young Lee
Jong Hun Kim
Yeonjoon Jung
June Chul Shin
Yangjin Lee
Kwanpyo Kim
Namwon Kim
Arend M. van der Zande
Jangyup Son
Gwan-Hyoung Lee
Evolution of defect formation during atomically precise desulfurization of monolayer MoS2
description Desulfurization of MoS2 alters its chemical and physical properties by breaking structural symmetry. Here, the atomic-scale mechanistic pathway by which this occurs is investigated during plasma etching, and changes in chemical structure and physical properties are revealed.
format article
author Jong-Young Lee
Jong Hun Kim
Yeonjoon Jung
June Chul Shin
Yangjin Lee
Kwanpyo Kim
Namwon Kim
Arend M. van der Zande
Jangyup Son
Gwan-Hyoung Lee
author_facet Jong-Young Lee
Jong Hun Kim
Yeonjoon Jung
June Chul Shin
Yangjin Lee
Kwanpyo Kim
Namwon Kim
Arend M. van der Zande
Jangyup Son
Gwan-Hyoung Lee
author_sort Jong-Young Lee
title Evolution of defect formation during atomically precise desulfurization of monolayer MoS2
title_short Evolution of defect formation during atomically precise desulfurization of monolayer MoS2
title_full Evolution of defect formation during atomically precise desulfurization of monolayer MoS2
title_fullStr Evolution of defect formation during atomically precise desulfurization of monolayer MoS2
title_full_unstemmed Evolution of defect formation during atomically precise desulfurization of monolayer MoS2
title_sort evolution of defect formation during atomically precise desulfurization of monolayer mos2
publisher Nature Portfolio
publishDate 2021
url https://doaj.org/article/ed299cd15c9141ce92bfacd76719fb4d
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