Impact of device scaling on the electrical properties of MoS2 field-effect transistors
Abstract Two-dimensional semiconducting materials are considered as ideal candidates for ultimate device scaling. However, a systematic study on the performance and variability impact of scaling the different device dimensions is still lacking. Here we investigate the scaling behavior across 1300 de...
Guardado en:
Autores principales: | Goutham Arutchelvan, Quentin Smets, Devin Verreck, Zubair Ahmed, Abhinav Gaur, Surajit Sutar, Julien Jussot, Benjamin Groven, Marc Heyns, Dennis Lin, Inge Asselberghs, Iuliana Radu |
---|---|
Formato: | article |
Lenguaje: | EN |
Publicado: |
Nature Portfolio
2021
|
Materias: | |
Acceso en línea: | https://doaj.org/article/f132e126bb2d4a5abc877181c5dbd890 |
Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
Ejemplares similares
-
Benchmarking monolayer MoS2 and WS2 field-effect transistors
por: Amritanand Sebastian, et al.
Publicado: (2021) -
Giant persistent photoconductivity in monolayer MoS2 field-effect transistors
por: A. George, et al.
Publicado: (2021) -
Optoelectronic synapse using monolayer MoS2 field effect transistors
por: Molla Manjurul Islam, et al.
Publicado: (2020) -
Atomic threshold-switching enabled MoS2 transistors towards ultralow-power electronics
por: Qilin Hua, et al.
Publicado: (2020) -
Gate-controlled reversible rectifying behaviour in tunnel contacted atomically-thin MoS2 transistor
por: Xiao-Xi Li, et al.
Publicado: (2017)