Multilayer Reflective Coatings for BEUV Lithography: A Review

The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviol...

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Autores principales: Paul C. Uzoma, Salman Shabbir, Huan Hu, Paul C. Okonkwo, Oleksiy V. Penkov
Formato: article
Lenguaje:EN
Publicado: MDPI AG 2021
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Acceso en línea:https://doaj.org/article/f5fc21867c9544bdb280ce19500ed8e8
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