Multilayer Reflective Coatings for BEUV Lithography: A Review

The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviol...

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Autores principales:	Paul C. Uzoma, Salman Shabbir, Huan Hu, Paul C. Okonkwo, Oleksiy V. Penkov
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	BEUV lithography multilayer mirrors X-ray optics reflectivity Chemistry QD1-999
Acceso en línea:	https://doaj.org/article/f5fc21867c9544bdb280ce19500ed8e8
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spelling	oai:doaj.org-article:f5fc21867c9544bdb280ce19500ed8e82021-11-25T18:29:45ZMultilayer Reflective Coatings for BEUV Lithography: A Review10.3390/nano111127822079-4991https://doaj.org/article/f5fc21867c9544bdb280ce19500ed8e82021-10-01T00:00:00Zhttps://www.mdpi.com/2079-4991/11/11/2782https://doaj.org/toc/2079-4991The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviolet to the extreme ultraviolet radiation. One approach toward decreasing the working wavelength is using lithography based on beyond extreme ultraviolet radiation (BEUV) with a wavelength around 7 nm. The BEUV lithography relies on advanced reflective optics such as periodic multilayer film X-ray mirrors (PMMs). PMMs are artificial Bragg crystals having alternate layers of “light” and “heavy” materials. The periodicity of such a structure is relatively half of the working wavelength. Because a BEUV lithographical system contains at least 10 mirrors, the optics’ reflectivity becomes a crucial point. The increasing of a single mirror’s reflectivity by 10% will increase the system’s overall throughput six-fold. In this work, the properties and development status of PMMs, particularly for BEUV lithography, were reviewed to gain a better understanding of their advantages and limitations. Emphasis was given to materials, design concepts, structure, deposition method, and optical characteristics of these coatings.Paul C. UzomaSalman ShabbirHuan HuPaul C. OkonkwoOleksiy V. PenkovMDPI AGarticleBEUV lithographymultilayer mirrorsX-ray opticsreflectivityChemistryQD1-999ENNanomaterials, Vol 11, Iss 2782, p 2782 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	BEUV lithography multilayer mirrors X-ray optics reflectivity Chemistry QD1-999
spellingShingle	BEUV lithography multilayer mirrors X-ray optics reflectivity Chemistry QD1-999 Paul C. Uzoma Salman Shabbir Huan Hu Paul C. Okonkwo Oleksiy V. Penkov Multilayer Reflective Coatings for BEUV Lithography: A Review
description	The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviolet to the extreme ultraviolet radiation. One approach toward decreasing the working wavelength is using lithography based on beyond extreme ultraviolet radiation (BEUV) with a wavelength around 7 nm. The BEUV lithography relies on advanced reflective optics such as periodic multilayer film X-ray mirrors (PMMs). PMMs are artificial Bragg crystals having alternate layers of “light” and “heavy” materials. The periodicity of such a structure is relatively half of the working wavelength. Because a BEUV lithographical system contains at least 10 mirrors, the optics’ reflectivity becomes a crucial point. The increasing of a single mirror’s reflectivity by 10% will increase the system’s overall throughput six-fold. In this work, the properties and development status of PMMs, particularly for BEUV lithography, were reviewed to gain a better understanding of their advantages and limitations. Emphasis was given to materials, design concepts, structure, deposition method, and optical characteristics of these coatings.
format	article
author	Paul C. Uzoma Salman Shabbir Huan Hu Paul C. Okonkwo Oleksiy V. Penkov
author_facet	Paul C. Uzoma Salman Shabbir Huan Hu Paul C. Okonkwo Oleksiy V. Penkov
author_sort	Paul C. Uzoma
title	Multilayer Reflective Coatings for BEUV Lithography: A Review
title_short	Multilayer Reflective Coatings for BEUV Lithography: A Review
title_full	Multilayer Reflective Coatings for BEUV Lithography: A Review
title_fullStr	Multilayer Reflective Coatings for BEUV Lithography: A Review
title_full_unstemmed	Multilayer Reflective Coatings for BEUV Lithography: A Review
title_sort	multilayer reflective coatings for beuv lithography: a review
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/f5fc21867c9544bdb280ce19500ed8e8
work_keys_str_mv	AT paulcuzoma multilayerreflectivecoatingsforbeuvlithographyareview AT salmanshabbir multilayerreflectivecoatingsforbeuvlithographyareview AT huanhu multilayerreflectivecoatingsforbeuvlithographyareview AT paulcokonkwo multilayerreflectivecoatingsforbeuvlithographyareview AT oleksiyvpenkov multilayerreflectivecoatingsforbeuvlithographyareview
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Multilayer Reflective Coatings for BEUV Lithography: A Review

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