Multilayer Reflective Coatings for BEUV Lithography: A Review
The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviol...
Guardado en:
Autores principales: | Paul C. Uzoma, Salman Shabbir, Huan Hu, Paul C. Okonkwo, Oleksiy V. Penkov |
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Formato: | article |
Lenguaje: | EN |
Publicado: |
MDPI AG
2021
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Materias: | |
Acceso en línea: | https://doaj.org/article/f5fc21867c9544bdb280ce19500ed8e8 |
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