Experimental measurements of Xe and Kr releases from UO2 and determination of their migration mechanisms – Release rate data

We present the raw data obtained from release rate at 1300°C of Xe and Kr implanted in UO2, related to [1]. We performed different sample preparation (polishing treatment) on polycrystalline and monocrystalline UO2. Ion implantation were performed at various fluences between 9.5 × 1010 to 5 × 1014 i...

Description complète

Enregistré dans:
Détails bibliographiques
Auteurs principaux: M. Gérardin, E. Gilabert, D. Horlait, M-F. Barthe, G. Carlot
Format: article
Langue:EN
Publié: Elsevier 2021
Sujets:
Accès en ligne:https://doaj.org/article/fc97ab6659754199a7e6a6e0248dbb01
Tags: Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!