Drain Induced Barrier Widening and Reverse Short Channel Effects in Tunneling FETs: Investigation and Analysis

In this paper, using calibrated TCAD simulations, we demonstrate how the performance of a Tunneling FET (TFET) can be improved by using a new phenomenon called drain induced barrier widening (DIBW) at the source-channel junction. Our results indicate that TFETs in which DIBW dominates exhibit a stee...

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Autores principales: Mamidala Karthik Ram, Neha Tiwari, Dawit Burusie Abdi, Sneh Saurabh
Formato: article
Lenguaje:EN
Publicado: IEEE 2021
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Acceso en línea:https://doaj.org/article/fd1719d153a84db3884bfc9a7ef41dde
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