Electrically reversible cracks in an intermetallic film controlled by an electric field
Electric-field-induced cracks are generally detrimental to functionality of ferroelectric ceramics. Liu et al. use an intermetallic alloy and ferroelectric oxide junction to mediate the reversible formation of cracks at nanoscales, resulting in colossal electroresistance modulation for memory applic...
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Nature Portfolio
2018
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oai:doaj.org-article:ffb9973e1ed645078b4f227d83caeac42021-12-02T17:31:16ZElectrically reversible cracks in an intermetallic film controlled by an electric field10.1038/s41467-017-02454-82041-1723https://doaj.org/article/ffb9973e1ed645078b4f227d83caeac42018-01-01T00:00:00Zhttps://doi.org/10.1038/s41467-017-02454-8https://doaj.org/toc/2041-1723Electric-field-induced cracks are generally detrimental to functionality of ferroelectric ceramics. Liu et al. use an intermetallic alloy and ferroelectric oxide junction to mediate the reversible formation of cracks at nanoscales, resulting in colossal electroresistance modulation for memory applications.Z. Q. LiuJ. H. LiuM. D. BiegalskiJ.-M. HuS. L. ShangY. JiJ. M. WangS. L. HsuA. T. WongM. J. CordillB. GludovatzC. MarkerH. YanZ. X. FengL. YouM. W. LinT. Z. WardZ. K. LiuC. B. JiangL. Q. ChenR. O. RitchieH. M. ChristenR. RameshNature PortfolioarticleScienceQENNature Communications, Vol 9, Iss 1, Pp 1-7 (2018) |
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Science Q Z. Q. Liu J. H. Liu M. D. Biegalski J.-M. Hu S. L. Shang Y. Ji J. M. Wang S. L. Hsu A. T. Wong M. J. Cordill B. Gludovatz C. Marker H. Yan Z. X. Feng L. You M. W. Lin T. Z. Ward Z. K. Liu C. B. Jiang L. Q. Chen R. O. Ritchie H. M. Christen R. Ramesh Electrically reversible cracks in an intermetallic film controlled by an electric field |
description |
Electric-field-induced cracks are generally detrimental to functionality of ferroelectric ceramics. Liu et al. use an intermetallic alloy and ferroelectric oxide junction to mediate the reversible formation of cracks at nanoscales, resulting in colossal electroresistance modulation for memory applications. |
format |
article |
author |
Z. Q. Liu J. H. Liu M. D. Biegalski J.-M. Hu S. L. Shang Y. Ji J. M. Wang S. L. Hsu A. T. Wong M. J. Cordill B. Gludovatz C. Marker H. Yan Z. X. Feng L. You M. W. Lin T. Z. Ward Z. K. Liu C. B. Jiang L. Q. Chen R. O. Ritchie H. M. Christen R. Ramesh |
author_facet |
Z. Q. Liu J. H. Liu M. D. Biegalski J.-M. Hu S. L. Shang Y. Ji J. M. Wang S. L. Hsu A. T. Wong M. J. Cordill B. Gludovatz C. Marker H. Yan Z. X. Feng L. You M. W. Lin T. Z. Ward Z. K. Liu C. B. Jiang L. Q. Chen R. O. Ritchie H. M. Christen R. Ramesh |
author_sort |
Z. Q. Liu |
title |
Electrically reversible cracks in an intermetallic film controlled by an electric field |
title_short |
Electrically reversible cracks in an intermetallic film controlled by an electric field |
title_full |
Electrically reversible cracks in an intermetallic film controlled by an electric field |
title_fullStr |
Electrically reversible cracks in an intermetallic film controlled by an electric field |
title_full_unstemmed |
Electrically reversible cracks in an intermetallic film controlled by an electric field |
title_sort |
electrically reversible cracks in an intermetallic film controlled by an electric field |
publisher |
Nature Portfolio |
publishDate |
2018 |
url |
https://doaj.org/article/ffb9973e1ed645078b4f227d83caeac4 |
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