Electrically reversible cracks in an intermetallic film controlled by an electric field
Electric-field-induced cracks are generally detrimental to functionality of ferroelectric ceramics. Liu et al. use an intermetallic alloy and ferroelectric oxide junction to mediate the reversible formation of cracks at nanoscales, resulting in colossal electroresistance modulation for memory applic...
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Auteurs principaux: | Z. Q. Liu, J. H. Liu, M. D. Biegalski, J.-M. Hu, S. L. Shang, Y. Ji, J. M. Wang, S. L. Hsu, A. T. Wong, M. J. Cordill, B. Gludovatz, C. Marker, H. Yan, Z. X. Feng, L. You, M. W. Lin, T. Z. Ward, Z. K. Liu, C. B. Jiang, L. Q. Chen, R. O. Ritchie, H. M. Christen, R. Ramesh |
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Format: | article |
Langue: | EN |
Publié: |
Nature Portfolio
2018
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Sujets: | |
Accès en ligne: | https://doaj.org/article/ffb9973e1ed645078b4f227d83caeac4 |
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