Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide

por Rainer Timm, Ashley R. Head, Sofie Yngman, Johan V. Knutsson, Martin Hjort, Sarah R. McKibbin, Andrea Troian, Olof Persson, Samuli Urpelainen, Jan Knudsen, Joachim Schnadt, Anders Mikkelsen
Publicado 2018