Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors

Atomically thin transition metal dichalcogenides offer a platform to explore the valley degree of freedom originating from their electronic band structure. Here, the authors use polarization- and time-resolved spectroscopy to investigate the temperature-dependent valley pseudospin relaxation process...

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Auteurs principaux: Yuhei Miyauchi, Satoru Konabe, Feijiu Wang, Wenjin Zhang, Alexander Hwang, Yusuke Hasegawa, Lizhong Zhou, Shinichiro Mouri, Minglin Toh, Goki Eda, Kazunari Matsuda
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Langue:EN
Publié: Nature Portfolio 2018
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Accès en ligne:https://doaj.org/article/082912cf98474f188c610f8ea787a283
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spelling oai:doaj.org-article:082912cf98474f188c610f8ea787a2832021-12-02T15:34:27ZEvidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors10.1038/s41467-018-04988-x2041-1723https://doaj.org/article/082912cf98474f188c610f8ea787a2832018-07-01T00:00:00Zhttps://doi.org/10.1038/s41467-018-04988-xhttps://doaj.org/toc/2041-1723Atomically thin transition metal dichalcogenides offer a platform to explore the valley degree of freedom originating from their electronic band structure. Here, the authors use polarization- and time-resolved spectroscopy to investigate the temperature-dependent valley pseudospin relaxation processes in WSe2 monolayers.Yuhei MiyauchiSatoru KonabeFeijiu WangWenjin ZhangAlexander HwangYusuke HasegawaLizhong ZhouShinichiro MouriMinglin TohGoki EdaKazunari MatsudaNature PortfolioarticleScienceQENNature Communications, Vol 9, Iss 1, Pp 1-10 (2018)
institution DOAJ
collection DOAJ
language EN
topic Science
Q
spellingShingle Science
Q
Yuhei Miyauchi
Satoru Konabe
Feijiu Wang
Wenjin Zhang
Alexander Hwang
Yusuke Hasegawa
Lizhong Zhou
Shinichiro Mouri
Minglin Toh
Goki Eda
Kazunari Matsuda
Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors
description Atomically thin transition metal dichalcogenides offer a platform to explore the valley degree of freedom originating from their electronic band structure. Here, the authors use polarization- and time-resolved spectroscopy to investigate the temperature-dependent valley pseudospin relaxation processes in WSe2 monolayers.
format article
author Yuhei Miyauchi
Satoru Konabe
Feijiu Wang
Wenjin Zhang
Alexander Hwang
Yusuke Hasegawa
Lizhong Zhou
Shinichiro Mouri
Minglin Toh
Goki Eda
Kazunari Matsuda
author_facet Yuhei Miyauchi
Satoru Konabe
Feijiu Wang
Wenjin Zhang
Alexander Hwang
Yusuke Hasegawa
Lizhong Zhou
Shinichiro Mouri
Minglin Toh
Goki Eda
Kazunari Matsuda
author_sort Yuhei Miyauchi
title Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors
title_short Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors
title_full Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors
title_fullStr Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors
title_full_unstemmed Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors
title_sort evidence for line width and carrier screening effects on excitonic valley relaxation in 2d semiconductors
publisher Nature Portfolio
publishDate 2018
url https://doaj.org/article/082912cf98474f188c610f8ea787a283
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