Metamaterial-Engineered Silicon Beam Splitter Fabricated with Deep UV Immersion Lithography

Subwavelength grating (SWG) metamaterials have garnered a great interest for their singular capability to shape the material properties and the propagation of light, allowing the realization of devices with unprecedented performance. However, practical SWG implementations are limited by fabrication...

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Autores principales:	Vladyslav Vakarin, Daniele Melati, Thi Thuy Duong Dinh, Xavier Le Roux, Warren Kut King Kan, Cécilia Dupré, Bertrand Szelag, Stéphane Monfray, Frédéric Boeuf, Pavel Cheben, Eric Cassan, Delphine Marris-Morini, Laurent Vivien, Carlos Alberto Alonso-Ramos
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	subwavelength grating metamaterial silicon photonics multi-mode interference coupler beam splitter Chemistry QD1-999
Acceso en línea:	https://doaj.org/article/1381e63113ea465e9bb395f266d5e229
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spelling	oai:doaj.org-article:1381e63113ea465e9bb395f266d5e2292021-11-25T18:31:06ZMetamaterial-Engineered Silicon Beam Splitter Fabricated with Deep UV Immersion Lithography10.3390/nano111129492079-4991https://doaj.org/article/1381e63113ea465e9bb395f266d5e2292021-11-01T00:00:00Zhttps://www.mdpi.com/2079-4991/11/11/2949https://doaj.org/toc/2079-4991Subwavelength grating (SWG) metamaterials have garnered a great interest for their singular capability to shape the material properties and the propagation of light, allowing the realization of devices with unprecedented performance. However, practical SWG implementations are limited by fabrication constraints, such as minimum feature size, that restrict the available design space or compromise compatibility with high-volume fabrication technologies. Indeed, most successful SWG realizations so far relied on electron-beam lithographic techniques, compromising the scalability of the approach. Here, we report the experimental demonstration of an SWG metamaterial engineered beam splitter fabricated with deep-ultraviolet immersion lithography in a 300-mm silicon-on-insulator technology. The metamaterial beam splitter exhibits high performance over a measured bandwidth exceeding 186 nm centered at 1550 nm. These results open a new route for the development of scalable silicon photonic circuits exploiting flexible metamaterial engineering.Vladyslav VakarinDaniele MelatiThi Thuy Duong DinhXavier Le RouxWarren Kut King KanCécilia DupréBertrand SzelagStéphane MonfrayFrédéric BoeufPavel ChebenEric CassanDelphine Marris-MoriniLaurent VivienCarlos Alberto Alonso-RamosMDPI AGarticlesubwavelength gratingmetamaterialsilicon photonicsmulti-mode interference couplerbeam splitterChemistryQD1-999ENNanomaterials, Vol 11, Iss 2949, p 2949 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	subwavelength grating metamaterial silicon photonics multi-mode interference coupler beam splitter Chemistry QD1-999
spellingShingle	subwavelength grating metamaterial silicon photonics multi-mode interference coupler beam splitter Chemistry QD1-999 Vladyslav Vakarin Daniele Melati Thi Thuy Duong Dinh Xavier Le Roux Warren Kut King Kan Cécilia Dupré Bertrand Szelag Stéphane Monfray Frédéric Boeuf Pavel Cheben Eric Cassan Delphine Marris-Morini Laurent Vivien Carlos Alberto Alonso-Ramos Metamaterial-Engineered Silicon Beam Splitter Fabricated with Deep UV Immersion Lithography
description	Subwavelength grating (SWG) metamaterials have garnered a great interest for their singular capability to shape the material properties and the propagation of light, allowing the realization of devices with unprecedented performance. However, practical SWG implementations are limited by fabrication constraints, such as minimum feature size, that restrict the available design space or compromise compatibility with high-volume fabrication technologies. Indeed, most successful SWG realizations so far relied on electron-beam lithographic techniques, compromising the scalability of the approach. Here, we report the experimental demonstration of an SWG metamaterial engineered beam splitter fabricated with deep-ultraviolet immersion lithography in a 300-mm silicon-on-insulator technology. The metamaterial beam splitter exhibits high performance over a measured bandwidth exceeding 186 nm centered at 1550 nm. These results open a new route for the development of scalable silicon photonic circuits exploiting flexible metamaterial engineering.
format	article
author	Vladyslav Vakarin Daniele Melati Thi Thuy Duong Dinh Xavier Le Roux Warren Kut King Kan Cécilia Dupré Bertrand Szelag Stéphane Monfray Frédéric Boeuf Pavel Cheben Eric Cassan Delphine Marris-Morini Laurent Vivien Carlos Alberto Alonso-Ramos
author_facet	Vladyslav Vakarin Daniele Melati Thi Thuy Duong Dinh Xavier Le Roux Warren Kut King Kan Cécilia Dupré Bertrand Szelag Stéphane Monfray Frédéric Boeuf Pavel Cheben Eric Cassan Delphine Marris-Morini Laurent Vivien Carlos Alberto Alonso-Ramos
author_sort	Vladyslav Vakarin
title	Metamaterial-Engineered Silicon Beam Splitter Fabricated with Deep UV Immersion Lithography
title_short	Metamaterial-Engineered Silicon Beam Splitter Fabricated with Deep UV Immersion Lithography
title_full	Metamaterial-Engineered Silicon Beam Splitter Fabricated with Deep UV Immersion Lithography
title_fullStr	Metamaterial-Engineered Silicon Beam Splitter Fabricated with Deep UV Immersion Lithography
title_full_unstemmed	Metamaterial-Engineered Silicon Beam Splitter Fabricated with Deep UV Immersion Lithography
title_sort	metamaterial-engineered silicon beam splitter fabricated with deep uv immersion lithography
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/1381e63113ea465e9bb395f266d5e229
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Metamaterial-Engineered Silicon Beam Splitter Fabricated with Deep UV Immersion Lithography

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