Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation
There is an increasing interest in atomic layer deposition (ALD) on polymers for the development of membranes, electronics, (3D) nanostructures and specially for the development of hermetic packaging of the new generation of flexible implantable micro-devices. This evolution demands a better underst...
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| Autores principales: | , , , , , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
MDPI AG
2021
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/1740f17d106f4acfb361c81bbefa0f4c |
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