Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation

There is an increasing interest in atomic layer deposition (ALD) on polymers for the development of membranes, electronics, (3D) nanostructures and specially for the development of hermetic packaging of the new generation of flexible implantable micro-devices. This evolution demands a better underst...

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Autores principales:	Laura Astoreca, David Schaubroeck, Parinaz Saadat Esbah Tabaei, Rouba Ghobeira, Maaike Op de Beeck, Rino Morent, Herbert De Smet, Nathalie De Geyter
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	ALD nucleation Al<sub>2</sub>O<sub>3</sub> HfO<sub>2</sub> polyimide plasma Engineering (General). Civil engineering (General) TA1-2040
Acceso en línea:	https://doaj.org/article/1740f17d106f4acfb361c81bbefa0f4c
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spelling	oai:doaj.org-article:1740f17d106f4acfb361c81bbefa0f4c2021-11-25T17:16:23ZInvestigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation10.3390/coatings111113522079-6412https://doaj.org/article/1740f17d106f4acfb361c81bbefa0f4c2021-11-01T00:00:00Zhttps://www.mdpi.com/2079-6412/11/11/1352https://doaj.org/toc/2079-6412There is an increasing interest in atomic layer deposition (ALD) on polymers for the development of membranes, electronics, (3D) nanostructures and specially for the development of hermetic packaging of the new generation of flexible implantable micro-devices. This evolution demands a better understanding of the ALD nucleation process on polymers, which has not been reported in a visual way. Herein, a visual study of ALD nucleation on polymers is presented, based on the different dry etching speeds between polymers (fast) and metal oxides (slow). An etching process removes the polyimide with the nucleating ALD acting as a mask, making the nucleation features visible through secondary electron microscopy analyses. The nucleation of both Al<sub>2</sub>O<sub>3</sub> and HfO<sub>2</sub> on polyimide was investigated. Both materials followed an island-coalescence nucleation. First, local islands formed, progressively coalescing into filaments, which connected and formed meshes. These meshes evolved into porous layers that eventually grew to a full layer, marking the end of the nucleation. Cross-sections were analyzed, observing no sub-surface growth. This approach was used to evaluate the influence of plasma-activating polyimide on the nucleation. Plasma-induced oxygen functionalities provided additional surface reactive sites for the ALD precursors to adsorb and start the nucleation. The presented nucleation study proved to be a straightforward and simple way to evaluate ALD nucleation on polymers.Laura AstorecaDavid SchaubroeckParinaz Saadat Esbah TabaeiRouba GhobeiraMaaike Op de BeeckRino MorentHerbert De SmetNathalie De GeyterMDPI AGarticleALDnucleationAl<sub>2</sub>O<sub>3</sub>HfO<sub>2</sub>polyimideplasmaEngineering (General). Civil engineering (General)TA1-2040ENCoatings, Vol 11, Iss 1352, p 1352 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	ALD nucleation Al<sub>2</sub>O<sub>3</sub> HfO<sub>2</sub> polyimide plasma Engineering (General). Civil engineering (General) TA1-2040
spellingShingle	ALD nucleation Al<sub>2</sub>O<sub>3</sub> HfO<sub>2</sub> polyimide plasma Engineering (General). Civil engineering (General) TA1-2040 Laura Astoreca David Schaubroeck Parinaz Saadat Esbah Tabaei Rouba Ghobeira Maaike Op de Beeck Rino Morent Herbert De Smet Nathalie De Geyter Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation
description	There is an increasing interest in atomic layer deposition (ALD) on polymers for the development of membranes, electronics, (3D) nanostructures and specially for the development of hermetic packaging of the new generation of flexible implantable micro-devices. This evolution demands a better understanding of the ALD nucleation process on polymers, which has not been reported in a visual way. Herein, a visual study of ALD nucleation on polymers is presented, based on the different dry etching speeds between polymers (fast) and metal oxides (slow). An etching process removes the polyimide with the nucleating ALD acting as a mask, making the nucleation features visible through secondary electron microscopy analyses. The nucleation of both Al<sub>2</sub>O<sub>3</sub> and HfO<sub>2</sub> on polyimide was investigated. Both materials followed an island-coalescence nucleation. First, local islands formed, progressively coalescing into filaments, which connected and formed meshes. These meshes evolved into porous layers that eventually grew to a full layer, marking the end of the nucleation. Cross-sections were analyzed, observing no sub-surface growth. This approach was used to evaluate the influence of plasma-activating polyimide on the nucleation. Plasma-induced oxygen functionalities provided additional surface reactive sites for the ALD precursors to adsorb and start the nucleation. The presented nucleation study proved to be a straightforward and simple way to evaluate ALD nucleation on polymers.
format	article
author	Laura Astoreca David Schaubroeck Parinaz Saadat Esbah Tabaei Rouba Ghobeira Maaike Op de Beeck Rino Morent Herbert De Smet Nathalie De Geyter
author_facet	Laura Astoreca David Schaubroeck Parinaz Saadat Esbah Tabaei Rouba Ghobeira Maaike Op de Beeck Rino Morent Herbert De Smet Nathalie De Geyter
author_sort	Laura Astoreca
title	Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation
title_short	Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation
title_full	Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation
title_fullStr	Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation
title_full_unstemmed	Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation
title_sort	investigating the nucleation of alo<sub>x</sub> and hfo<sub>x</sub> ald on polyimide: influence of plasma activation
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/1740f17d106f4acfb361c81bbefa0f4c
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Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation

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