Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation

Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation

There is an increasing interest in atomic layer deposition (ALD) on polymers for the development of membranes, electronics, (3D) nanostructures and specially for the development of hermetic packaging of the new generation of flexible implantable micro-devices. This evolution demands a better underst...

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Detalles Bibliográficos
Autores principales: Laura Astoreca, David Schaubroeck, Parinaz Saadat Esbah Tabaei, Rouba Ghobeira, Maaike Op de Beeck, Rino Morent, Herbert De Smet, Nathalie De Geyter
Formato: article
Lenguaje:EN
Publicado: MDPI AG 2021
Materias:
ALD
nucleation
Al<sub>2</sub>O<sub>3</sub>
HfO<sub>2</sub>
polyimide
plasma
Engineering (General). Civil engineering (General)
TA1-2040
Acceso en línea:https://doaj.org/article/1740f17d106f4acfb361c81bbefa0f4c
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