Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation

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Investigating the Nucleation of AlO<sub>x</sub> and HfO<sub>x</sub> ALD on Polyimide: Influence of Plasma Activation

There is an increasing interest in atomic layer deposition (ALD) on polymers for the development of membranes, electronics, (3D) nanostructures and specially for the development of hermetic packaging of the new generation of flexible implantable micro-devices. This evolution demands a better underst...

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Auteurs principaux:	Laura Astoreca, David Schaubroeck, Parinaz Saadat Esbah Tabaei, Rouba Ghobeira, Maaike Op de Beeck, Rino Morent, Herbert De Smet, Nathalie De Geyter
Format:	article
Langue:	EN
Publié:	MDPI AG 2021
Sujets:	ALD nucleation Al<sub>2</sub>O<sub>3</sub> HfO<sub>2</sub> polyimide plasma Engineering (General). Civil engineering (General) TA1-2040
Accès en ligne:	https://doaj.org/article/1740f17d106f4acfb361c81bbefa0f4c
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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