GeSnOI mid-infrared laser technology

Abstract GeSn alloys are promising materials for CMOS-compatible mid-infrared lasers manufacturing. Indeed, Sn alloying and tensile strain can transform them into direct bandgap semiconductors. This growing laser technology however suffers from a number of limitations, such as poor optical confineme...

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Autores principales: Binbin Wang, Emilie Sakat, Etienne Herth, Maksym Gromovyi, Andjelika Bjelajac, Julien Chaste, Gilles Patriarche, Philippe Boucaud, Frédéric Boeuf, Nicolas Pauc, Vincent Calvo, Jérémie Chrétien, Marvin Frauenrath, Alexei Chelnokov, Vincent Reboud, Jean-Michel Hartmann, Moustafa El Kurdi
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Publicado: Nature Publishing Group 2021
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Acceso en línea:https://doaj.org/article/37bfa51b9002480b9af4751b7b33e82a
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spelling oai:doaj.org-article:37bfa51b9002480b9af4751b7b33e82a2021-11-21T12:26:53ZGeSnOI mid-infrared laser technology10.1038/s41377-021-00675-72047-7538https://doaj.org/article/37bfa51b9002480b9af4751b7b33e82a2021-11-01T00:00:00Zhttps://doi.org/10.1038/s41377-021-00675-7https://doaj.org/toc/2047-7538Abstract GeSn alloys are promising materials for CMOS-compatible mid-infrared lasers manufacturing. Indeed, Sn alloying and tensile strain can transform them into direct bandgap semiconductors. This growing laser technology however suffers from a number of limitations, such as poor optical confinement, lack of strain, thermal, and defects management, all of which are poorly discussed in the literature. Herein, a specific GeSn-on-insulator (GeSnOI) stack using stressor layers as dielectric optical claddings is demonstrated to be suitable for a monolithically integration of planar Group-IV semiconductor lasers on a versatile photonic platform for the near- and mid-infrared spectral range. Microdisk-shape resonators on mesa structures were fabricated from GeSnOI, after bonding a Ge0.9Sn0.1 alloy layer grown on a Ge strain-relaxed-buffer, itself on a Si(001) substrate. The GeSnOI microdisk mesas exhibited significantly improved optical gain as compared to that of conventional suspended microdisk resonators formed from the as-grown layer. We further show enhanced vertical out-coupling of the disk whispering gallery mode in-plane radiation, with up to 30% vertical out-coupling efficiency. As a result, the GeSnOI approach can be a valuable asset in the development of silicon-based mid-infrared photonics that combine integrated sources in a photonic platform with complex lightwave engineering.Binbin WangEmilie SakatEtienne HerthMaksym GromovyiAndjelika BjelajacJulien ChasteGilles PatriarchePhilippe BoucaudFrédéric BoeufNicolas PaucVincent CalvoJérémie ChrétienMarvin FrauenrathAlexei ChelnokovVincent ReboudJean-Michel HartmannMoustafa El KurdiNature Publishing GrouparticleApplied optics. PhotonicsTA1501-1820Optics. LightQC350-467ENLight: Science & Applications, Vol 10, Iss 1, Pp 1-13 (2021)
institution DOAJ
collection DOAJ
language EN
topic Applied optics. Photonics
TA1501-1820
Optics. Light
QC350-467
spellingShingle Applied optics. Photonics
TA1501-1820
Optics. Light
QC350-467
Binbin Wang
Emilie Sakat
Etienne Herth
Maksym Gromovyi
Andjelika Bjelajac
Julien Chaste
Gilles Patriarche
Philippe Boucaud
Frédéric Boeuf
Nicolas Pauc
Vincent Calvo
Jérémie Chrétien
Marvin Frauenrath
Alexei Chelnokov
Vincent Reboud
Jean-Michel Hartmann
Moustafa El Kurdi
GeSnOI mid-infrared laser technology
description Abstract GeSn alloys are promising materials for CMOS-compatible mid-infrared lasers manufacturing. Indeed, Sn alloying and tensile strain can transform them into direct bandgap semiconductors. This growing laser technology however suffers from a number of limitations, such as poor optical confinement, lack of strain, thermal, and defects management, all of which are poorly discussed in the literature. Herein, a specific GeSn-on-insulator (GeSnOI) stack using stressor layers as dielectric optical claddings is demonstrated to be suitable for a monolithically integration of planar Group-IV semiconductor lasers on a versatile photonic platform for the near- and mid-infrared spectral range. Microdisk-shape resonators on mesa structures were fabricated from GeSnOI, after bonding a Ge0.9Sn0.1 alloy layer grown on a Ge strain-relaxed-buffer, itself on a Si(001) substrate. The GeSnOI microdisk mesas exhibited significantly improved optical gain as compared to that of conventional suspended microdisk resonators formed from the as-grown layer. We further show enhanced vertical out-coupling of the disk whispering gallery mode in-plane radiation, with up to 30% vertical out-coupling efficiency. As a result, the GeSnOI approach can be a valuable asset in the development of silicon-based mid-infrared photonics that combine integrated sources in a photonic platform with complex lightwave engineering.
format article
author Binbin Wang
Emilie Sakat
Etienne Herth
Maksym Gromovyi
Andjelika Bjelajac
Julien Chaste
Gilles Patriarche
Philippe Boucaud
Frédéric Boeuf
Nicolas Pauc
Vincent Calvo
Jérémie Chrétien
Marvin Frauenrath
Alexei Chelnokov
Vincent Reboud
Jean-Michel Hartmann
Moustafa El Kurdi
author_facet Binbin Wang
Emilie Sakat
Etienne Herth
Maksym Gromovyi
Andjelika Bjelajac
Julien Chaste
Gilles Patriarche
Philippe Boucaud
Frédéric Boeuf
Nicolas Pauc
Vincent Calvo
Jérémie Chrétien
Marvin Frauenrath
Alexei Chelnokov
Vincent Reboud
Jean-Michel Hartmann
Moustafa El Kurdi
author_sort Binbin Wang
title GeSnOI mid-infrared laser technology
title_short GeSnOI mid-infrared laser technology
title_full GeSnOI mid-infrared laser technology
title_fullStr GeSnOI mid-infrared laser technology
title_full_unstemmed GeSnOI mid-infrared laser technology
title_sort gesnoi mid-infrared laser technology
publisher Nature Publishing Group
publishDate 2021
url https://doaj.org/article/37bfa51b9002480b9af4751b7b33e82a
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