Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
Abstract One of the limiting factors of graphene integration into electronic, photonic, or sensing devices is the unavailability of large-scale graphene directly grown on the isolators. Therefore, it is necessary to transfer graphene from the donor growth wafers onto the isolating target wafers. In...
Enregistré dans:
| Auteurs principaux: | , , , , , , |
|---|---|
| Format: | article |
| Langue: | EN |
| Publié: |
Nature Portfolio
2021
|
| Sujets: | |
| Accès en ligne: | https://doaj.org/article/437b9e6e890d4f0b9a0094b3ddfb0afe |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|