Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

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Autores principales: R. Lukose, M. Lisker, F. Akhtar, M. Fraschke, T. Grabolla, A. Mai, M. Lukosius
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2021
Materias:
Medicine
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Science
Q
Acceso en línea:https://doaj.org/article/4f9b79be76fe41669de01e71dbdb4648
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spelling oai:doaj.org-article:4f9b79be76fe41669de01e71dbdb46482021-12-02T16:45:47ZAuthor Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene10.1038/s41598-021-96605-z2045-2322https://doaj.org/article/4f9b79be76fe41669de01e71dbdb46482021-08-01T00:00:00Zhttps://doi.org/10.1038/s41598-021-96605-zhttps://doaj.org/toc/2045-2322R. LukoseM. LiskerF. AkhtarM. FraschkeT. GrabollaA. MaiM. LukosiusNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 11, Iss 1, Pp 1-1 (2021)
institution DOAJ
collection DOAJ
language EN
topic Medicine
R
Science
Q
spellingShingle Medicine
R
Science
Q
R. Lukose
M. Lisker
F. Akhtar
M. Fraschke
T. Grabolla
A. Mai
M. Lukosius
Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
format article
author R. Lukose
M. Lisker
F. Akhtar
M. Fraschke
T. Grabolla
A. Mai
M. Lukosius
author_facet R. Lukose
M. Lisker
F. Akhtar
M. Fraschke
T. Grabolla
A. Mai
M. Lukosius
author_sort R. Lukose
title Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
title_short Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
title_full Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
title_fullStr Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
title_full_unstemmed Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
title_sort author correction: influence of plasma treatment on sio2/si and si3n4/si substrates for large-scale transfer of graphene
publisher Nature Portfolio
publishDate 2021
url https://doaj.org/article/4f9b79be76fe41669de01e71dbdb4648
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