Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography
Editor's Note: this Article has been retracted; the Retraction Note is available at https://doi.org/10.1038/s41598-021-84101-3 .
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| Autores principales: | , , , , , , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
Nature Portfolio
2021
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/5a42cf72e4ee410ebfe331db92d13003 |
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