Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Editor's Note: this Article has been retracted; the Retraction Note is available at https://doi.org/10.1038/s41598-021-84101-3 .

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Detalles Bibliográficos
Autores principales:	Alireza Kazemi, Xiang He, Seyedhamidreza Alaie, Javad Ghasemi, Noel Mayur Dawson, Francesca Cavallo, Terefe G. Habteyes, Steven R. J. Brueck, Sanjay Krishna
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2021
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/5a42cf72e4ee410ebfe331db92d13003
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

Descripción
Sumario:	Editor's Note: this Article has been retracted; the Retraction Note is available at https://doi.org/10.1038/s41598-021-84101-3 .

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