Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Editor's Note: this Article has been retracted; the Retraction Note is available at https://doi.org/10.1038/s41598-021-84101-3 .

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Autores principales:	Alireza Kazemi, Xiang He, Seyedhamidreza Alaie, Javad Ghasemi, Noel Mayur Dawson, Francesca Cavallo, Terefe G. Habteyes, Steven R. J. Brueck, Sanjay Krishna
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2021
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/5a42cf72e4ee410ebfe331db92d13003
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spelling	oai:doaj.org-article:5a42cf72e4ee410ebfe331db92d130032021-12-02T14:28:14ZRetraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography10.1038/s41598-021-84101-32045-2322https://doaj.org/article/5a42cf72e4ee410ebfe331db92d130032021-02-01T00:00:00Zhttps://doi.org/10.1038/s41598-021-84101-3https://doaj.org/toc/2045-2322Editor's Note: this Article has been retracted; the Retraction Note is available at https://doi.org/10.1038/s41598-021-84101-3 .Alireza KazemiXiang HeSeyedhamidreza AlaieJavad GhasemiNoel Mayur DawsonFrancesca CavalloTerefe G. HabteyesSteven R. J. BrueckSanjay KrishnaNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 11, Iss 1, Pp 1-1 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Alireza Kazemi Xiang He Seyedhamidreza Alaie Javad Ghasemi Noel Mayur Dawson Francesca Cavallo Terefe G. Habteyes Steven R. J. Brueck Sanjay Krishna Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography
description	Editor's Note: this Article has been retracted; the Retraction Note is available at https://doi.org/10.1038/s41598-021-84101-3 .
format	article
author	Alireza Kazemi Xiang He Seyedhamidreza Alaie Javad Ghasemi Noel Mayur Dawson Francesca Cavallo Terefe G. Habteyes Steven R. J. Brueck Sanjay Krishna
author_facet	Alireza Kazemi Xiang He Seyedhamidreza Alaie Javad Ghasemi Noel Mayur Dawson Francesca Cavallo Terefe G. Habteyes Steven R. J. Brueck Sanjay Krishna
author_sort	Alireza Kazemi
title	Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography
title_short	Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography
title_full	Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography
title_fullStr	Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography
title_full_unstemmed	Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography
title_sort	retraction note: large-area semiconducting graphene nanomesh tailored by interferometric lithography
publisher	Nature Portfolio
publishDate	2021
url	https://doaj.org/article/5a42cf72e4ee410ebfe331db92d13003
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Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

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