Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Editor's Note: this Article has been retracted; the Retraction Note is available at https://doi.org/10.1038/s41598-021-84101-3 .

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Autores principales: Alireza Kazemi, Xiang He, Seyedhamidreza Alaie, Javad Ghasemi, Noel Mayur Dawson, Francesca Cavallo, Terefe G. Habteyes, Steven R. J. Brueck, Sanjay Krishna
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2021
Materias:
Medicine
R
Science
Q
Acceso en línea:https://doaj.org/article/5a42cf72e4ee410ebfe331db92d13003
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