Anisotropic etching of graphite and graphene in a remote hydrogen plasma
Nanofabrication: remote etching of graphene on hBN is highly anisotropic Etching of graphite with hydrogen plasma gives rise to two distinct etching regimes, governed by the degree of direct plasma exposure. A team led by D. M. Zumbühl at the University of Basel investigated the interplay between gr...
Saved in:
| Main Authors: | , , , , , , , , |
|---|---|
| Format: | article |
| Language: | EN |
| Published: |
Nature Portfolio
2017
|
| Subjects: | |
| Online Access: | https://doaj.org/article/6716f4d3bc44416793f3e688bdacf5f5 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|