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Low-energy Ar+ and N+ ion beam induced chemical vapor deposition using hexamethyldisilazane for the formation of nitrogen containing SiC and carbon containing SiN films.
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Low-energy Ar+ and N+ ion beam induced chemical vapor deposition using hexamethyldisilazane for the formation of nitrogen containing SiC and carbon containing SiN films.
by
Satoru Yoshimura
,
Satoshi Sugimoto
,
Takae Takeuchi
,
Kensuke Murai
,
Masato Kiuchi
Published 2021
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Low-energy Ar+ and N+ ion beam induced chemical vapor deposition using hexamethyldisilazane for the formation of nitrogen containing SiC and carbon containing SiN films
by
Satoru Yoshimura
,
Satoshi Sugimoto
,
Takae Takeuchi
,
Kensuke Murai
,
Masato Kiuchi
Published 2021
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Fuente de Datos
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2
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article
Author
Kensuke Murai
2
Masato Kiuchi
2
Satoru Yoshimura
2
Satoshi Sugimoto
2
Takae Takeuchi
2
Language
EN
2
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